ECR sputter technology.

Sputter Probes and Vapor Sources for ECR Ion Sources

Sputter probes are a promising method for injecting controlled quantities of metallic elements inside ECRIS, provided that the sputter rate can be controlled, so that high charge states and low sample consumption rate will be attained. Moreover pressure at the probe and inside the source should be different. With a sputter probe distance of 25 mm from ECRIS plasma, a 200 nA current of Sn was ea...

ECR 2014, Part B

ECR 2014, Part A

Sputter deposition processes

Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of a source material, the target. Ion bombardment results in a vapor due to a purely physical process, i.e. the sputtering of the target material. Hence, this technique is part of the class of physical vapor deposition techniques, which includes, for example, thermal ev...

ECR 2014, Part E